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Alloy sputtering target----titanium aluminium alloy target Ti Al target

  • BAOJI OUKAI
  • Ti Al
  • <100μm
  • 99.5-99.99%
  • Widely used in coating processing industries
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Item Name: Alloy sputtering target----titanium aluminium alloy target  Ti Al target

Material: Ti  Al 

Technics: Hot Isostatic Pressing

Application: Widely used in coating processing industries

A: LCD ,photoelectric devices field.

B: Electronic and semiconductor field.

C: Decoration and mould field.


TiAl target used for the protective wear resistant layers and decorative coatings, with composition of 50:50 at%, 60:40 at%, 67:33 at%, 70:30 at%.

 
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