Advantages of magnetron sputtering technology

　　Magnetron sputtering has been developed rapidly and widely applied since its inception. It effectively impacts the status of other coating methods and is mainly determined by its advantages:

　　1. The deposition rate is fast, the substrate temperature rise is low, the damage to the film is small;

　　2. The films obtained by sputtering combine well with the substrate;

　　3. For most materials, as long as the rake material can be made, you can achieve sputtering;

　　4. The films obtained by sputtering have high purity, good compactness and good uniformity of film formation;

　　5. The thickness of the coating can be controlled accurately, and the particle size of the film can be controlled by changing the parameter condition;

　　6. The sputtering process has good repeatability, and the film with uniform thickness can be obtained on a large area substrate;

　　7. Different metals, alloys and oxides can be mixed and sputtered on the substrate;

　　8. Easy to achieve industrialization.