You are here: Home » Products » High Purity Sputtering Targets for Semiconductor and Electronics » 99.999% titanium target Ti sputtering target for PVD coating machine

Search for related products

Share to:

99.999% titanium target Ti sputtering target for PVD coating machine

  • BAOJI OUKAI
  • TI
  • <100μm
  • 99.999%
  • Semiconductor materials
Quantity:

Item name: 99.999% titanium target  Ti sputtering  target for PVD coating machine

Material: Ti  

Purity:  99.999%

Grain size: <100μm

Technics: Powder Metallurgy

Application: Semiconductor materials, vacuum coating, sintering trays and boats, special chemical applications,PVD, CVD.

 
Copyright © 2009-2016 Baoji Okai Sputtering Targets Technology Co.,Ltd.  Support: BRAIN