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99.999% titanium target Ti sputtering target for PVD coating machine

  • BAOJI OUKAI
  • TI
  • ＜100μm
  • 99.999%
  • Semiconductor materials
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Item name: 99.999% titanium target  Ti sputtering  target for PVD coating machine

Material: Ti  

Purity:  99.999%

Grain size: ＜100μm

Technics: Powder Metallurgy

Application: Semiconductor materials, vacuum coating, sintering trays and boats, special chemical applications,PVD, CVD.

 
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