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Item name: 99.999% titanium target Ti sputtering target for PVD coating machine
Material: Ti
Purity: 99.999%
Grain size: ＜100μm
Technics: Powder Metallurgy
Application: Semiconductor materials, vacuum coating, sintering trays and boats, special chemical applications,PVD, CVD.
Item name: 99.999% titanium target Ti sputtering target for PVD coating machine
Material: Ti
Purity: 99.999%
Grain size: ＜100μm
Technics: Powder Metallurgy
Application: Semiconductor materials, vacuum coating, sintering trays and boats, special chemical applications,PVD, CVD.
