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Name: 99.95% Ta Tantalum sputtering target for optics industry
Material: Ta
Purity: 99.95%
Grain size: ＜100μm
Techinics: Hot Isostatic Pressing (HIP), Powder Metallurgy, Patented thermo-mechanical process
Application: Widely used in coating processing industries
A: Magnetic Data Storage Application
B: Electronic and Semiconductor Application.
C: Decoration and Coating Application. etc.
