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99.95% Ta Tantalum sputtering target for optics industry

  • BAOJI OUKAI
  • tantalum
  • <100μm
  • 99.95%
  • Widely used in coating processing industries
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Name: 99.95% Ta Tantalum sputtering target for optics industry

Material: Ta

Purity: 99.95%

Grain size: <100μm

Techinics: Hot Isostatic Pressing (HIP), Powder Metallurgy, Patented thermo-mechanical process

Application: Widely used in coating processing industries

A: Magnetic Data Storage Application

B: Electronic and Semiconductor Application.

C: Decoration and Coating Application. etc.


 
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