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4N-6N planar copper sputtering target

  • OUKAI
  • Cu
  • <100μm
  • 99.99%
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Item:4N-6N planar copper sputtering target

Material: Cu

Purity:>99.99%

Grain Size: <100μm

Application:Production of pure copper film, for decorative glass mirror film, PCB plate coating.


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